On Universality in Sputtering Yields Due to Cluster Bombardment.

Correction to "On Universality in Sputtering Yields Due to Cluster Bombardment".

Seduction of Finding Universality in Sputtering Yields Due to Cluster Bombardment of Solids.

Universal descriptions are appealing because they simplify the description of different (but similar) physical systems, allow the determination of general properties, and have practical applications. Recently, the concept of universality has been applied to the dependence of the sputtering (ejection) yield due to energetic cluster bombardment versus the energy of the incident cluster. It was ob...

Simulation of cluster ejection following high - energy Au n Au ( 111 ) bombardment

Following the recent report by Andersen et al. of extremely large nonlinear sputtering yields caused by the bombardment of gold targets with small, high energy gold clusters [Phys. Rev. Lett. 80 (1998) 5433], we carried out simulations showing: (1) that the thermal spike phase of the collision cascade contributes significantly to these nonlinear yields; and (2) that individual 'mega-events' wit...

Simulations of C60 bombardment of Si, SiC, diamond and graphite

Molecular dynamics simulations of the 20-keV C60 bombardment at normal incidence of Si, SiC, diamond and graphite targets were performed. The unique feature of these targets is that strong covalent bonds can be formed between carbon atoms from the C60 projectile and atoms in the solid material. The mesoscale energy deposition footprint (MEDF) model is used to gain physical insight into how the ...

Effect of surface morphology on the sputtering yields. I. Ion sputtering from self-affine surfaces

As extensive experimental studies have shown, under certain conditions, ion bombardment of solid targets induces a random (self-affine) morphology on the ion-eroded surfaces. The rough morphology development is known to cause substantial variations in the sputtering yields. In this article, we present a theoretical model describing the sputter yields from random, self-affine surfaces subject to...